The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2012
Filed:
Aug. 26, 2008
Hikaru Imamura, Toyama, JP;
Yasushi Sakaida, Toyama, JP;
Makoto Nakajima, Toyama, JP;
Satoshi Takei, Toyama, JP;
Hikaru Imamura, Toyama, JP;
Yasushi Sakaida, Toyama, JP;
Makoto Nakajima, Toyama, JP;
Satoshi Takei, Toyama, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
There is provided a composition for forming a resist underlayer film that can be homogeneously applied and a sublimate is suppressed during the thermal curing. There is also provided a composition for forming a resist underlayer film having a high selection ratio of dry etching relative to a resist applied thereon. A composition for forming a resist underlayer film for lithography comprising: a polysilane compound having a unit structure of Formula (1): (where Rand Rare independently a group of —X—Y (where X is an oxygen atom, a Calkylene group or a group of —OCH— (where n is an integer of 1 to 18) and Y is a lactone ring or an adamantane ring), or one of Rand Ris the group of —X—Y and another thereof is an aryl group, a methyl group, an ethyl group or a Ccycloalkyl group); and an organic solvent.