The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2012
Filed:
Apr. 02, 2009
Applicants:
Jung Hoon OH, Cheonan-si, KR;
Sang Jin Kim, Asan-si, KR;
Jin Ho Kim, Asan-si, KR;
Dae Hyeon Shin, Seoul, KR;
Inventors:
Jung Hoon Oh, Cheonan-si, KR;
Sang Jin Kim, Asan-si, KR;
Jin Ho Kim, Asan-si, KR;
Dae Hyeon Shin, Seoul, KR;
Assignee:
Korea Kumho Petrochemical Co., Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C08F 10/00 (2006.01); C07C 69/773 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved.