The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Nov. 10, 2009
Ching Long Tsai, Singapore, SG;
Shi Jie Bai, Singapore, SG;
Shan Liu, Singapore, SG;
Yu Zhang, Singapore, SG;
Ching Long Tsai, Singapore, SG;
Shi Jie Bai, Singapore, SG;
Shan Liu, Singapore, SG;
Yu Zhang, Singapore, SG;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A circuit layout structure includes a metal interlayer dielectric layer surrounding a metal interconnect and a metal pattern within a scrub line. The scrub line is in the vicinity of the metal interlayer dielectric layer and the metal interconnect. The metal pattern or the metal interconnect are suitably segregated to reduce a capacitance charging effect.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile