The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Oct. 24, 2011
Ryuuichi Saitou, Tokyo, JP;
Kang-go Chung, Tokyo, JP;
Hideki Nishimura, Tokyo, JP;
Tatsuya Sakai, Tokyo, JP;
Sanshiro Komiya, Tokyo, JP;
Naoto Noda, Tokyo, JP;
Maki Nishiguchi, Tokyo, JP;
Ryuuichi Saitou, Tokyo, JP;
Kang-go Chung, Tokyo, JP;
Hideki Nishimura, Tokyo, JP;
Tatsuya Sakai, Tokyo, JP;
Sanshiro Komiya, Tokyo, JP;
Naoto Noda, Tokyo, JP;
Maki Nishiguchi, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Tri Chemical Laboratories Inc., Uenohara-shi, JP;
Abstract
A method for producing ruthenium compound including the step of reacting a compound represented by General Formula (1): RuL(wherein Lrepresents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds) with trifluorophosphine or reacting the compound represented by General Formula (1) with trifluorophosphine, and hydrogen or a halogen to obtain a compound represented by General Formula (2): Ru(PF)(L)(L)(wherein Lrepresents a hydrogen atom or halogen atom, Lrepresents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds, l is an integer from 1 to 5, m is an integer from 0 to 4, and n is an integer from 0 to 2, provided that l+m+2n=5 or 6). With this method, a trifluorophosphine-ruthenium compound can be synthesized under low-temperature and low-pressure conditions.