The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Apr. 07, 2011
Kenichi Fujii, Aizuwakamatsu, JP;
Masahiko Higashi, Aizuwakamatsu, JP;
Kenichi Fujii, Aizuwakamatsu, JP;
Masahiko Higashi, Aizuwakamatsu, JP;
Spansion LLC, Santa Clara, CA (US);
Abstract
There are provided a semiconductor device and a fabrication method therefor including an ONO film () formed on a semiconductor substrate (), a word line () formed on the ONO film (), a bit line () formed in the semiconductor substrate (), and a conductive layer () that is in contact with the bit line (), runs in a length direction of the bit line (), and includes a polysilicon layer or a metal layer. In accordance with the present invention, a semiconductor device and a fabrication method therefor are provided wherein degradation of the writing and erasing characteristics and degradation of the transistor characteristics such as a junction leakage are suppressed, and the bit line resistance is decreased.