The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2012
Filed:
Apr. 23, 2010
Yuichiro Morozumi, Nirasaki, JP;
Kenichi Koyanagi, Tokyo-to, JP;
Takashi Arao, Tokyo-to, JP;
Kazunori Une, Tokyo-to, JP;
Yuichiro Morozumi, Nirasaki, JP;
Kenichi Koyanagi, Tokyo-to, JP;
Takashi Arao, Tokyo-to, JP;
Kazunori Une, Tokyo-to, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A technique for effectively suppressing the generation of particles resulting from peeling-off of unnecessary films that have unavoidably adhered to the inner surface of the reaction tube of an ALD film-forming apparatus during a film formation process for forming a film on a semiconductor substrate. A precoating process utilizing ALD is performed to deposit a metal oxide film, e.g., an aluminum oxide film, onto the unnecessary films, in order to prevent peeling-off of the unnecessary films. Ozone is supplied, as a precoat gas, into the reaction tube during the precoating process by a nozzle of a different type and/or position from that of the nozzle for supplying ozone, as a film-forming gas, into the reaction tube during the film formation process.