The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2012
Filed:
Jun. 25, 2010
Akira Ikegami, Hitachinaka, JP;
Hideyuki Kazumi, Hitachinaka, JP;
Koichiro Takeuchi, Hitachinaka, JP;
Atsushi Kobaru, Hitachinaka, JP;
Seiko Oomori, Kokubunji, JP;
Akira Ikegami, Hitachinaka, JP;
Hideyuki Kazumi, Hitachinaka, JP;
Koichiro Takeuchi, Hitachinaka, JP;
Atsushi Kobaru, Hitachinaka, JP;
Seiko Oomori, Kokubunji, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.