The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Dec. 18, 2009
Alan Frank DE Jong, Eindhoven, NL;
Johannes Jacobus Lambertus Mulders, Eindhoven, NL;
Wilhelmus Mathijs Marie Kessels, Tilburg, NL;
Adriaan Jacobus Martinus Mackus, Eindhoven, NL;
Alan Frank De Jong, Eindhoven, NL;
Johannes Jacobus Lambertus Mulders, Eindhoven, NL;
Wilhelmus Mathijs Marie Kessels, Tilburg, NL;
Adriaan Jacobus Martinus Mackus, Eindhoven, NL;
FEI Company, Hillsboro, OR (US);
Abstract
The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapor Deposition, a high quality layer can be grown. An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited.