The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2012

Filed:

Apr. 19, 2010
Applicants:

Yoshiyuki Utsumi, Kawasaki, JP;

Jun Iwashita, Kawasaki, JP;

Inventors:

Yoshiyuki Utsumi, Kawasaki, JP;

Jun Iwashita, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 24/00 (2006.01); C08F 34/02 (2006.01); G03C 1/00 (2006.01); G03F 7/00 (2006.01); G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a0) containing an acid-dissociable, dissolution-inhibiting group, and the acid-dissociable, dissolution-inhibiting group has a 1,3-dioxole skeleton.


Find Patent Forward Citations

Utsumi, Yoshiyuki. (2012). Positive resist composition, method of forming resist pattern, polymeric compound, and compound (U.S. Patent No. 8268530). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8268530

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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