The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Sep. 23, 2004
Joseph M. Desimone, Chapel Hill, NC (US);
Jason P. Rolland, Durham, NC (US);
Stephen R. Quake, Stanford, CA (US);
Derek A. Schorzman, Chapel Hill, NC (US);
Jason Yarbrough, Spartanburg, SC (US);
Michael Van Dam, Glendale, CA (US);
Joseph M. DeSimone, Chapel Hill, NC (US);
Jason P. Rolland, Durham, NC (US);
Stephen R. Quake, Stanford, CA (US);
Derek A. Schorzman, Chapel Hill, NC (US);
Jason Yarbrough, Spartanburg, SC (US);
Michael Van Dam, Glendale, CA (US);
The University of North Carolina at Chapel Hill, Chapel Hill, NC (US);
Abstract
The use of a photocurable perfluoropolyether (PFPE) material for fabricating a solvent-resistant PFPE-based microfluidic device, methods of flowing a material and performing a chemical reaction in a solvent-resistant PFPE-based microfluidic device, and the solvent-resistant PFPE-based microfluidic devices themselves are described. In an embodiment, a method is described for preparing a patterned layer of a photocured perfluoropolyether, the method comprising: (a) providing a substrate, wherein the substrate comprises a patterned surface; (b) contacting a perfluoropolvether precursor with the patterned surface of the substrate; and (c) photocuring the perfluoropolyether precursor to form a patterned layer of a photocured perfluoropolyether.