The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Jun. 08, 2007
Shoubin Zhang, Sanda, JP;
Hayato Sasaki, Ryugasaki, JP;
Shozo Komiyama, Sanda, JP;
Akifumi Mishima, Saitama, JP;
Shoubin Zhang, Sanda, JP;
Hayato Sasaki, Ryugasaki, JP;
Shozo Komiyama, Sanda, JP;
Akifumi Mishima, Saitama, JP;
Mitsubishi Materials Corporation, Tokyo, JP;
Abstract
A high-strength sputtering target for forming a protective film for an optical recording medium, obtained by sintering a mixed powder containing, in mol %, 10 to 70% of a zirconium oxide or hafnium oxide and 50% or less (over 0%) of silicon dioxide, and 0.1 to 8.4% of yttrium oxide as necessary, and the remainder containing aluminum oxide, lanthanum oxide, or indium oxide and inevitable impurities, wherein a complex oxide phase of AlSiO, LaSiO, or InSiOis formed in a base of the target.