The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Dec. 20, 2004
Joseph M. Desimone, Chapel Hill, NC (US);
Jason P. Rolland, Durham, NC (US);
Benjamin W. Maynor, Durham, NC (US);
Larken E. Euliss, Chapel Hill, NC (US);
Ginger Denison Rothrock, Durham, NC (US);
Ansley E Dennis, Augusta, GA (US);
Edward T. Samulski, Chapel Hill, NC (US);
R. Jude Samulski, Chapel Hill, NC (US);
Joseph M. DeSimone, Chapel Hill, NC (US);
Jason P. Rolland, Durham, NC (US);
Benjamin W. Maynor, Durham, NC (US);
Larken E. Euliss, Chapel Hill, NC (US);
Ginger Denison Rothrock, Durham, NC (US);
Ansley E Dennis, Augusta, GA (US);
Edward T. Samulski, Chapel Hill, NC (US);
R. Jude Samulski, Chapel Hill, NC (US);
The University of North Carolina at Chapel Hill, Chapel Hill, NC (US);
Abstract
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.