The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2012

Filed:

Mar. 11, 2008
Applicants:

David L. Bender, Thousand Oaks, CA (US);

David E. A. Smith, San Mateo, CA (US);

Inventors:

David L. Bender, Thousand Oaks, CA (US);

David E. A. Smith, San Mateo, CA (US);

Assignee:

Solaicx, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 21/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A weir is extended vertically to define an optimal annular gap between the top of the weir and the underside of a super-adjacent heat shield. The annular gap provides a high velocity stream of argon gas to be directed from the growth region to the melt region to substantially eliminate the transport of airborne particles from the melt region to the growth region. The tall weir may be configured as a modular, reusable weir extension supportably engaged with an outer (and/or inner) weir.


Find Patent Forward Citations

Bender, David. (2012). Weir design providing optimal purge gas flow, melt control, and temperature stabilization for improved single crystal growth in a continuous czochralski process (U.S. Patent No. 8262797). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8262797

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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