The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Dec. 21, 2009
Ali Afzali-ardakani, Yorktown Heights, NY (US);
Mahmoud Khojasteh, Yorktown Heights, NY (US);
Ronald W. Nunes, Yorktown Heights, NY (US);
George G. Totir, Yorktown Heights, NY (US);
Ali Afzali-Ardakani, Yorktown Heights, NY (US);
Mahmoud Khojasteh, Yorktown Heights, NY (US);
Ronald W. Nunes, Yorktown Heights, NY (US);
George G. Totir, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A spin-on formulation that is useful in stripping an ion implanted photoresist is provided that includes an aqueous solution of a water soluble polymer containing at least one acidic functional group, and at least one lanthanide metal-containing oxidant. The spin-on formulation is applied to an ion implanted photoresist and baked to form a modified photoresist. The modified photoresist is soluble in aqueous, acid or organic solvents. As such one of the aforementioned solvents can be used to completely strip the ion implanted photoresist as well as any photoresist residue that may be present. A rinse step can follow the stripping of the modified photoresist.