The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2012

Filed:

Jan. 07, 2010
Applicants:

Edwin Jackson Little, Denver, CO (US);

Max William Reed, Niwot, CO (US);

Christopher Rathweg, Louisville, CO (US);

Mark Jeffrey Pavol, Arvada, CO (US);

Inventors:

Edwin Jackson Little, Denver, CO (US);

Max William Reed, Niwot, CO (US);

Christopher Rathweg, Louisville, CO (US);

Mark Jeffrey Pavol, Arvada, CO (US);

Assignee:

PrimeStar Solar, Inc., Arvada, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); G01F 11/00 (2006.01); B65G 53/40 (2006.01); B65B 1/04 (2006.01); B65B 3/04 (2006.01); B67C 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A feed system and related process are configured to continuously feed measured doses of source material to a vapor deposition apparatus wherein the source material is sublimated and deposited as a thin film on a substrate. The system includes a bulk material hopper, and an upper dose cup disposed to receive source material from the hopper. A lower dose cup is disposed in a vacuum lock chamber to receive a measured dose of source material from the upper dose cup. A transfer mechanism is disposed below the vacuum lock chamber to receive the measured dose of source material from the lower dose cup and to transfer the source material to a downstream deposition head while isolating the deposition conditions and sublimated source material within the deposition head.


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