The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2012
Filed:
Jan. 28, 2010
Jensheng Huang, San Jose, CA (US);
Xin Zheng, Sunnyvale, CA (US);
Kyo-il Koo, Seoul, KR;
Synopsys, Inc., Mountain View, CA (US);
Abstract
One embodiment of the present invention relates to a system that calibrates a photolithography process model. During operation, the system receives a process model which models a photolithography process. The system further receives measured critical dimension (CD) values for a first set of features that were printed by applying the photolithography process to a layout. The system then calibrates the process model using the measured CD values so that CD values predicted by the process model substantially match the measured CD values, and depth of focus (DOF) values predicted by the process model for a second set of features are substantially maximized.