The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 2012
Filed:
Jul. 14, 2010
Christophe Licitra, Grenoble, FR;
Maxime Besacier, Saint Jean de Moirans, FR;
Régis Bouyssou, Fontaine, FR;
Thierry Chevolleau, Grenoble, FR;
Mohamed El Kodadi, Grenoble, FR;
Christophe Licitra, Grenoble, FR;
Maxime Besacier, Saint Jean de Moirans, FR;
Régis Bouyssou, Fontaine, FR;
Thierry Chevolleau, Grenoble, FR;
Mohamed El Kodadi, Grenoble, FR;
Abstract
An optical characterization method of repeat units forming a diffraction structure, each repeat unit including a geometric pattern produced, at least in part, using a porous material, the method including: determining the geometric parameters of the patterns; performing a scatterometric acquisition using an optical measurement system of the experimental optical response of the diffraction structure placed in a chamber at a given pressure, a presence of an adsorbable gaseous substance in the chamber causing condensation of the adsorbable gaseous substance in a part of open pores of the patterns; and determining a theoretical optical response of the diffraction structure from the determined geometric parameters and by adjusting an optical index of the material of an area of each of the patterns, in which the adsorbable gaseous substance has condensed, to make a difference between the experimental response and the theoretical response less than or equal to a given threshold.