The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2012

Filed:

Mar. 26, 2009
Applicants:

Sébastien Cattet, Domene, FR;

Guillaume Cattet-guerrini, Legal Representative, Montfavet, FR;

Lise Guerrini, Legal Representative, Montfavet, FR;

Nadia Ben Mohamed, Echirolles, FR;

Benjamin Scarfogliere, Grenoble, FR;

Inventors:
Assignee:

Soitec, Bernin, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

In order to reduce and render uniform the surface roughness and variations in thickness of a layer after detachment (post-fracture) of a donor substrate, the mean temperature of the donor substrate during implantation thereof is controlled so as to be in the range 20° C. to 150° C. with a maximum temperature variation of less than 30° C.


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Cattet, Sébastien. (2012). Controlled temperature implantation (U.S. Patent No. 8247309). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8247309

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