The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Jun. 17, 2009
Vitally Prosyentsov, Deurne, NL;
Sanjaysingh Lalbahadoersing, Helmond, NL;
Sami Musa, Veldhoven, NL;
Hyun-woo Lee, Veldhoven, NL;
Vitally Prosyentsov, Deurne, NL;
Sanjaysingh Lalbahadoersing, Helmond, NL;
Sami Musa, Veldhoven, NL;
Hyun-Woo Lee, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A substrate stage for an immersion type lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate, the substrate stage being constructed to hold the substrate and including at least a sensor for sensing the patterned radiation beam, the sensor including an at least partially transmissive layer having a front side facing the incoming radiation beam and a back side opposite the front side, wherein the back side is provided with at least a sensor mark to be subjected to the radiation beam transmitted through the layer.