The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Dec. 19, 2008
Roelof Frederik DE Graaf, Veldhoven, NL;
Hans Jansen, Eindhoven, NL;
Bauke Jansen, Deurne, NL;
Hubertus Leonardus Franciscus Heusschen, Eindhoven, NL;
Roelof Frederik De Graaf, Veldhoven, NL;
Hans Jansen, Eindhoven, NL;
Bauke Jansen, Deurne, NL;
Hubertus Leonardus Franciscus Heusschen, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion type lithographic apparatus includes an immersion system configured to at least partially fill an immersion space with an immersion liquid. The apparatus also includes an indicator configured to indicate whether a part of the immersion system should be cleaned and a cleaning liquid supply system configured to supply a cleaner to the part of the lithographic apparatus. The cleaner is at least one of a plurality of different cleaners. Each cleaner or combination of cleaners is configured to clean a different type and/or level of contamination in the part of the lithographic apparatus. The apparatus also includes a controller configured to control which of the plurality of cleaners is provided to the part of the lithographic apparatus, based on an indication received from the indicator.