The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Jan. 23, 2009
William D. Lee, Newburyport, MA (US);
Ashwin M. Purohit, Gloucester, MA (US);
Marvin R. Lafontaine, Kingston, NH (US);
William D. Lee, Newburyport, MA (US);
Ashwin M. Purohit, Gloucester, MA (US);
Marvin R. LaFontaine, Kingston, NH (US);
Axcelis Technologies, Inc., Beverly, MA (US);
Abstract
The present invention is directed to an apparatus and method of forming a thermos layer surrounding a chuck for holding a wafer during ion implantation. The thermos layer is located below a clamping surface, and comprises a vacuum gap and an outer casing encapsulating the vacuum gap. The thermos layer provides a barrier blocking condensation to the outside of the chuck within a process chamber by substantially preventing heat transfer between the chuck when it is cooled and the warmer environment within the process chamber.