The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2012
Filed:
Jul. 29, 2009
Applicants:
Mahadevan Ganapathisubramanian, Austin, TX (US);
Byung-jin Choi, Austin, TX (US);
Liang Wang, Austin, TX (US);
Alex Ruiz, Spicewood, TX (US);
Inventors:
Mahadevan Ganapathisubramanian, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Liang Wang, Austin, TX (US);
Alex Ruiz, Spicewood, TX (US);
Assignee:
Molecular Imprints, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Energy sources and methods for curing in an imprint lithography system are described. The energy sources may include one or more energy elements positioned outside of the viewing range of an imaging unit monitoring elements of the imprint lithography system. Each energy source is configured to provide energy along a path to solidify polymerizable material on a substrate.