The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2012
Filed:
Dec. 31, 2008
Applicants:
Yakov Shor, Sheva, IL;
Semeon Altshuler, Le Zion, IL;
Maor Rotlain, Gat, IL;
Yigal Alon, Gan Yavne, IL;
Dror Horvitz, Bear Tuviya, IL;
Inventors:
Yakov Shor, Sheva, IL;
Semeon Altshuler, Le Zion, IL;
Maor Rotlain, Gat, IL;
Yigal Alon, Gan Yavne, IL;
Dror Horvitz, Bear Tuviya, IL;
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/60 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of plug fill for high aspect ratio plugs wherein a nucleation layer is formed at a bottom of a via and not on the sidewalls. The plug fill is in the direction from bottom to top of the via and not inwards from the sidewalls. The resulting plug is voidless and seamless.