Wet processing system, wet processing method and storage medium

Abstract

A wet processing system detects a globule of a process solution in a drippy or dripping state from the tip of any one of process solution pouring nozzles being moved to a pouring position for pouring the process solution onto a substrate by obtaining image data on the process solution pouring nozzle, and takes proper measures to prevent the process solution from dripping. A wet processing systempours a process solution, such as a resist solution, through one of process solution pouring nozzlesonto a surface of a substrate, such as a wafer W, held substantially horizontally by a substrate holding devicesurrounded by a cupto process the surface by a wet process. A nozzle carrying mechanismcarries the process solution pouring nozzlesbetween a home position on a nozzle bathand a pouring position above the substrate held by the substrate holding device. An optical image of the tips of the process solution pouring nozzlesis obtained by an image pickup means, such as a camera. Predetermined measures are taken according to the level of a drippy or dripping state of a globule of the process solution.