The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2012
Filed:
Nov. 09, 2007
Lon Wang, Taipei, TW;
Yung-pin Chen, Tainan, TW;
Chih-sheng Jao, Taoyuan County, TW;
Shuo-hung Chang, Taipei County, TW;
Jer-haur Chang, Changhua County, TW;
Lon Wang, Taipei, TW;
Yung-Pin Chen, Tainan, TW;
Chih-Sheng Jao, Taoyuan County, TW;
Shuo-Hung Chang, Taipei County, TW;
Jer-Haur Chang, Changhua County, TW;
Industrial Technology Research Institute, Hsin-Chu, TW;
Abstract
The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield.