The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2012
Filed:
Apr. 03, 2008
Joy Cheng, San Jose, CA (US);
William D. Hinsberg, Fremont, CA (US);
Ho-cheol Kim, San Jose, CA (US);
Charles T. Rettner, San Jose, CA (US);
Daniel P. Sanders, San Jose, CA (US);
Joy Cheng, San Jose, CA (US);
William D. Hinsberg, Fremont, CA (US);
Ho-Cheol Kim, San Jose, CA (US);
Charles T. Rettner, San Jose, CA (US);
Daniel P. Sanders, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed are methods of forming polymer structures comprising: applying a solution of a block copolymer assembly comprising at least one block copolymer to a neutral substrate having a chemical pattern thereon, the chemical pattern comprising alternating pinning and neutral regions that are chemically distinct and have a first spatial frequency given by the number of paired sets of pinning and neutral regions along a given direction on the substrate; and forming domains of the block copolymer that form by lateral segregation of the blocks in accordance with the underlying chemical pattern, wherein at least one domain of the block copolymer assembly has an affinity for the pinning regions, wherein a structure extending across the chemical pattern is produced, the structure having a uniform second spatial frequency given by the number of repeating sets of domains along the given direction that is at least twice that of the first spatial frequency.