The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2012
Filed:
Mar. 06, 2007
Fumitoshi Oikawa, Tokyo, JP;
Shinji Kajita, Tokyo, JP;
Fumitoshi Oikawa, Tokyo, JP;
Shinji Kajita, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A substrate processing apparatus includes: a polishing deviceA for polishing the surface of a substrate; and at least one of an ultrasonic cleaning devicefor cleaning the surface of the substrate with ultrasonic waves transmitted through a liquid, and a two-fluid jet cleaning devicefor cleaning the surface of the substrate with a two-fluid jet spouted as a mixture of a gas and a liquid. A substrate processing method includes: a polishing step of polishing the surface of a substrate; and a solid matter noncontact cleaning step of cleaning the surface of the substrate by spraying a liquid to the surface of the substrate. The above apparatus and method make it possible to efficiently clean the surface of a substrate after it is polished.