The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 24, 2012

Filed:

Apr. 26, 2007
Applicants:

Alexander Matyushkin, San Jose, CA (US);

Dennis Koosau, Hayward, CA (US);

Theodoros Panagopoulos, San Jose, CA (US);

John Holland, San Jose, CA (US);

Inventors:

Alexander Matyushkin, San Jose, CA (US);

Dennis Koosau, Hayward, CA (US);

Theodoros Panagopoulos, San Jose, CA (US);

John Holland, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/22 (2006.01); C23C 16/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electrostatic chuck for receiving a substrate in a substrate processing chamber comprises a ceramic puck having a substrate receiving surface and an opposing backside surface with a plurality of spaced apart mesas. An electrode is embedded in the ceramic puck to generate an electrostatic force to hold a substrate. Heater coils located at peripheral and central portions of the ceramic puck allow independent control of temperatures of the central and peripheral portions of the ceramic puck. The chuck is supported by a base having a groove with retained air. The chuck and base can also have an overlying edge ring and clamp ring.


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