The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2012
Filed:
Jul. 28, 2010
Koutarou Tanaka, Osaka, JP;
Masahiko Niwayama, Kyoto, JP;
Masao Uchida, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
A method of producing a semiconductor device according to the present invention includes: a step of implanting an impurity into a semiconductor layerby using a first implantation mask layer, thereby forming a body region; a step of implanting an impurity by using the first implantation mask layerand a second implantation mask layer, thereby forming a contact regionwithin the body region; a step of forming a third implantation mask layer, and thereafter selectively removing the second implantation mask layer; a step of forming a side wallon a side face of the first implantation mask layer; and a step of implanting an impurity to form a source regionwithin the body region
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile