The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2012
Filed:
Mar. 30, 2007
Duane Outka, Fremont, CA (US);
Jason Augustino, Fremont, CA (US);
Armen Avoyan, Glendale, CA (US);
Stephen Whitten, Danville, CA (US);
Hong Shih, Walnut, CA (US);
Yan Fang, Fremont, CA (US);
Duane Outka, Fremont, CA (US);
Jason Augustino, Fremont, CA (US);
Armen Avoyan, Glendale, CA (US);
Stephen Whitten, Danville, CA (US);
Hong Shih, Walnut, CA (US);
Yan Fang, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Methods of cleaning plasma processing chamber components include contacting surfaces of the components with a cleaning solution, while avoiding damage of other surfaces or areas of the components by the cleaning solution. An exemplary plasma processing chamber component to be cleaning is an elastomer bonded electrode assembly having a silicon member with a plasma-exposed silicon surface, a backing member, and an elastomer bonding material between the silicon surface and the backing member.