The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2012

Filed:

Jun. 07, 2007
Applicants:

Masayuki Iljima, Kanagawa, JP;

Yosuke Kobayashi, Kanagawa, JP;

Kouji Hirayama, Kanagawa, JP;

Yusuke Hashimoto, Kanagawa, JP;

Ryuji Hamada, Kanagawa, JP;

Ken Momono, Kanagawa, JP;

Atsushi Nakatsuka, Kanagawa, JP;

Inventors:

Masayuki Iljima, Kanagawa, JP;

Yosuke Kobayashi, Kanagawa, JP;

Kouji Hirayama, Kanagawa, JP;

Yusuke Hashimoto, Kanagawa, JP;

Ryuji Hamada, Kanagawa, JP;

Ken Momono, Kanagawa, JP;

Atsushi Nakatsuka, Kanagawa, JP;

Assignee:

Ulvac, Inc., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is a deposition apparatus that has a metal evaporation source for depositing a reflective layer, a pigment evaporation source for depositing a coloring layer, and a plasma polymerization source (electrode) for depositing a protective layer disposed inside a single vacuum processing room. By carrying out a step of depositing the reflective layer, a step of depositing the coloring layer, and a step of depositing the protective layer in the common vacuum processing room, processes can be simplified and an operation time can be reduced.


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