The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Feb. 18, 2004
Akisuke Hirata, Chiba-ken, JP;
Shinji Isoda, Chiba-ken, JP;
Yutaka Kadowaki, Chiba-ken, JP;
Katsuhiko Mushiake, Tokyo, JP;
Akisuke Hirata, Chiba-ken, JP;
Shinji Isoda, Chiba-ken, JP;
Yutaka Kadowaki, Chiba-ken, JP;
Katsuhiko Mushiake, Tokyo, JP;
Ulvac, Inc., Kanagawa, JP;
Abstract
There are provided a film forming equipment component having a structure in which an deposited film d formed on the component can be separated from the component for a time period shorter than the prior art to reduce damage due to a cleaning fluid S, and a method of cleaning such a component. A metal film layerelectrochemically less noble than the matrix metal materialof the aforementioned component is formed on the surface of the matrix metal materialthrough thermal spraying, vapor depositing, sputtering, laminating or other process. Alternatively, a second metal film layerelectrochemically more noble than the aforementioned matrix metal materialis formed on the surface of the metal film layerthrough said thermal spraying or other process. Thus, a local cell is formed between the metal film layerand the matrix metal materialor the second metal film layer. Therefore, the deposited film d can be separated from the matrix metal materialfor an extremely shortened time period, without damaging the matrix metal materialitself from the cleaning fluid S.