The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Jun. 02, 2011
Hong Shih, Walnut, CA (US);
Qian Fu, Fremont, CA (US);
Tuochuan Huang, Saratoga, CA (US);
Raphael Casaes, Oakland, CA (US);
Duane Outka, Fremont, CA (US);
Hong Shih, Walnut, CA (US);
Qian Fu, Fremont, CA (US);
Tuochuan Huang, Saratoga, CA (US);
Raphael Casaes, Oakland, CA (US);
Duane Outka, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method of extending storage time prior to cleaning a component of a plasma chamber is provided. The method comprises removing the component from the chamber, covering a thermal spray coating on the component while the surface is exposed to atmospheric air, storing the component, optionally removing the covering, and optionally wet cleaning reaction by-products from the thermal spray coating. Alternatively, instead of, or in addition to covering a thermal spray coating on the component, the component can be placed into a desiccator or dry-box.