The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
May. 21, 2008
Atsushi Nakamura, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Junichi Takahashi, Tokyo, JP;
Takayoshi Abe, Tokyo, JP;
Tomoki Nagai, Tokyo, JP;
Tomohiro Kakizawa, Tokyo, JP;
Atsushi Nakamura, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Junichi Takahashi, Tokyo, JP;
Takayoshi Abe, Tokyo, JP;
Tomoki Nagai, Tokyo, JP;
Tomohiro Kakizawa, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern.