The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
Nov. 02, 2006
Kazuhiko Maeda, Tokyo, JP;
Mitsutaka Otani, Kawagoe, JP;
Haruhiko Komoriya, Kawagoe, JP;
Takeo Komata, Kawagoe, JP;
Shinya Akiba, Kawagoe, JP;
Kazuhiko Maeda, Tokyo, JP;
Mitsutaka Otani, Kawagoe, JP;
Haruhiko Komoriya, Kawagoe, JP;
Takeo Komata, Kawagoe, JP;
Shinya Akiba, Kawagoe, JP;
Central Glass Company, Limited, Yamaguchi, JP;
Abstract
A method for forming a protective film of a fluorine-containing polymer composition excellent in smoothness and adhesiveness on a photoresist. Moreover, there is provided a means for removing the protective film without impairing the underlying photoresist. A polymer coating composition obtainable by dissolving a fluorine-containing polymer compound in a solvent comprising a fluorinated acetal having a specific structure is applied on a photoresist and dried to form a protective film. A fluorinated acetal having the specific structure is suitable as a solvent for being brought into contact with a fluorine-containing polymer film, peeling the film, and forming a photoresist or a lithographic pattern.