The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2012
Filed:
Sep. 12, 2003
Chi-an Kao, Hsin-Chu, TW;
Yung-chang Chang, Sindian, TW;
Yu-ping Chang, Taipei, TW;
Ling-sung Wang, Hsin-Chu, TW;
Chi-An Kao, Hsin-Chu, TW;
Yung-Chang Chang, Sindian, TW;
Yu-Ping Chang, Taipei, TW;
Ling-Sung Wang, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A new method is provided for the creation of a hole through a layer of insulating material. The method provides for combining a feed-forward method with a feed backward method and a high-polymer based hole profile, in order to establish a hole of a constant Critical Dimension for the hole bottom, making the CD of the hole bottom independent of the CD of the opening created through the overlying developed layer of photoresist and independent of the thickness of the layer of insulator material after CMP has been applied to the surface of the insulation layer.