The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2012

Filed:

Dec. 13, 2007
Applicants:

Ian S. Dees, Aloha, OR (US);

Craig D. Bryant, Portland, OR (US);

Lynne A. Fitzsimmons, Portland, OR (US);

Inventors:

Ian S. Dees, Aloha, OR (US);

Craig D. Bryant, Portland, OR (US);

Lynne A. Fitzsimmons, Portland, OR (US);

Assignee:

Tektronix, Inc., Beaverton, OR (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06T 11/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

Automatic generation of a frequency domain mask is achieved by drawing a reduced waveform representing frequency domain data for an input signal as a pixel map. The reduced waveform is blurred by applying a user selected frequency offset, and from the blurred waveform data points are selected to generate upper and lower limits. The selected upper limit data points form an upper limit mask and the lower limit data points form a lower limit mask. When the upper and lower limit data masks are combined and translated back to frequency/amplitude units from the pixel map, they form an envelope mask.


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