Gas head and thin-film manufacturing apparatus

Abstract

A gas head that, at low cost, is capable of suppressing any deactivation of radical gas and capable of uniformly introducing a raw material gas on a substrate; and a relevant thin-film manufacturing apparatus are provided. A gas head () according to the present invention includes a reactive gas introduction port (A) for introduction of a reactive gas, a plurality of raw material gas introduction ports (B) for introduction of a raw material gas, and a dispersion board () for dispersing the raw material gas, wherein the plurality of the raw material gas introduction ports (B) are disposed so as to surround the periphery of the reactive gas introduction port (A). The reactive gas having been introduced in the reactive gas introduction port (A) is mixed with the raw material gas having been introduced through a plurality of raw material gas introduction ports (B) and dispersed by means of the dispersion board (). Although the plurality of raw material gas introduction ports (B) are disposed around the reactive gas introduction port (A), they are not required to be minute holes such as shower holes.