The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
Jun. 07, 2011
Yoshikazu Hiura, Yamanashi, JP;
Hiroki Adachi, Yamanashi, JP;
Hironobu Takahashi, Yamanashi, JP;
Yuusuke Sugawara, Yamanashi, JP;
Tatsuya Arao, Ebina, JP;
Kazuo Nishi, Yamanashi, JP;
Yasuyuki Arai, Kanagawa, JP;
Yoshikazu Hiura, Yamanashi, JP;
Hiroki Adachi, Yamanashi, JP;
Hironobu Takahashi, Yamanashi, JP;
Yuusuke Sugawara, Yamanashi, JP;
Tatsuya Arao, Ebina, JP;
Kazuo Nishi, Yamanashi, JP;
Yasuyuki Arai, Kanagawa, JP;
Semiconductor Energy Laboratory Co., Ltd., Kanagawa-ken, JP;
Abstract
The present invention relates to a film formation apparatus including a first transfer chamber having a roller for sending a substrate, a film formation chamber having a discharging electrode, a buffer chamber provided between the transfer chamber and the film formation chamber or between the film formation chambers, a slit provided in a portion where the substrate comes in and out in the buffer chamber, and a second transfer chamber having a roller for rewinding the substrate. The slit is provided with at least one touch roller, and the touch roller is in contact with a film formation surface of the substrate. In addition, the present invention also relates to a method for forming a film and a method for manufacturing a photoelectric conversion device that are performed by using such a film formation apparatus.