The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2012
Filed:
May. 09, 2007
Arie Jeffrey Den Boef, Waalre, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Mircea Dusa, Campbell, CA (US);
Irwan Dani Setija, Utrecht, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Mircea Dusa, Campbell, CA (US);
Irwan Dani Setija, Utrecht, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam passing through the mask to acquire the pattern, simulating radiating the substrate with a patterned radiation beam that has been patterned using the mask to obtain a simulated pattern, determining at least one location of the simulated pattern that is prone to patterning errors, and irradiating the substrate with the patterned radiation beam using a lithographic process. The method also includes measuring an accuracy of at least one property of the at least one location of the pattern on the substrate that has been determined as being prone to patterning errors, and adjusting the lithographic process according to the measuring.