The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
Feb. 17, 2011
Ikuma Ohta, Tokyo, JP;
Norio Hayashi, Kanagawa, JP;
Takayuki Tsutsui, Kanagawa, JP;
Fuminori Morisawa, Kanagawa, JP;
Masatoshi Hase, Tokyo, JP;
Ikuma Ohta, Tokyo, JP;
Norio Hayashi, Kanagawa, JP;
Takayuki Tsutsui, Kanagawa, JP;
Fuminori Morisawa, Kanagawa, JP;
Masatoshi Hase, Tokyo, JP;
Renesas Electronics Corporation, Kanagawa, JP;
Abstract
A high-frequency power amplifier which can reduce a variation of power gain due to the dependence on gate length of a power amplification field effect transistor is provided. The high-frequency power amplifier comprises, over a semiconductor chip, a bias control circuit, a bias transistor and an amplification transistor which are coupled so as to configure a current mirror circuit, and a gate length monitor circuit comprising a replicating transistor. The amplification transistor amplifies an RF signal and a bias current of the bias control circuit is supplied to the bias transistor. The transistors are fabricated by the same semiconductor manufacturing process, and have the same variation of gate length. The gate length monitor circuit generates a detection voltage depending on the gate length. According to the detection voltage, the bias control circuit controls the bias current, thereby compensating the gate length dependence of transconductance of the amplification transistor.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile