The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2012

Filed:

Mar. 31, 2009
Applicants:

Eyal Bar-sadeh, Jerusalem, IL;

Nuriel Amir, Doar Na Shikmim, IL;

Alexander Ripp, Beer Sheva, IL;

Yakov Shor, Beer Sheva, IL;

Dror Horvitz, Bear Tuvia, IL;

Inventors:

Eyal Bar-sadeh, Jerusalem, IL;

Nuriel Amir, Doar Na Shikmim, IL;

Alexander Ripp, Beer Sheva, IL;

Yakov Shor, Beer Sheva, IL;

Dror Horvitz, Bear Tuvia, IL;

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 51/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method and systems provide growth of polymer structures at a high rate in a selective manner. In various embodiments, the method or system can expose the growth site to a polymer source and growing a polymer tube at a rate of at least 80 micrometer per hour at the growth site. The method or system can provide selectivity by providing a growth site on a substrate by patterning a metal, such as copper, that provides a seed site for the polymer. Non-selected sites can be coated with a polymer growth inhibitor, such as polyimide or silicon nitride.


Find Patent Forward Citations

Loading…