The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
Sep. 01, 2009
Yoichi Takahara, Tokyo, JP;
Fumio Kataoka, Kamisato, JP;
Kenji Yumiba, Kamisato, JP;
Kenji Katagiri, Kamisato, JP;
Ryo Izaki, Nakai, JP;
Yoichi Takahara, Tokyo, JP;
Fumio Kataoka, Kamisato, JP;
Kenji Yumiba, Kamisato, JP;
Kenji Katagiri, Kamisato, JP;
Ryo Izaki, Nakai, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Equipment is realized which is capable of increasing the frequency of use of a deposition mask of an organic EL element and the recycle of an adhesive agent by efficiently cleaning the deposition mask with little damage and efficiently collecting the adhesive agent. A pulse laser is irradiated to a deposition mask to separate the deposition agent from the deposition mask. The separated deposition agent is sucked by a suction nozzle, and the deposition agent is separated from air by a cyclone and deposited on a bottom of the cyclone. Thereafter, a first valve is opened to collect the deposition agent in a deposition agent collection section. Then a second valve is opened to move the deposition agent to a deposition agent refining section to be refined. A third valve is opened to store the refined deposition agent in a deposition agent storage section. The deposition mask may be cleaned without being damaged to collect the deposition agent with high efficiency.