The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2012

Filed:

Jul. 30, 2009
Applicants:

Harmen Klaas Van Der Schoot, Vught, NL;

Hernes Jacobs, Eindhoven, NL;

Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;

Petrus Matthijs Henricus Vosters, Bladel, NL;

Johannes Martinus Andreas Hazenberg, Veldhoven, NL;

Aart Adrianus Van Beuzekom, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.


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