The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Jun. 21, 2007
Daisuke Shimizu, Tokyo, JP;
Hikaru Sugita, Tokyo, JP;
Nobuji Matsumura, Tokyo, JP;
Toshiyuki Kai, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Daisuke Shimizu, Tokyo, JP;
Hikaru Sugita, Tokyo, JP;
Nobuji Matsumura, Tokyo, JP;
Toshiyuki Kai, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.