The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Jan. 08, 2009
Takanori Yamagishi, Funabashi, JP;
Tomo Oikawa, Ichihara, JP;
Ichiro Kato, Chiba, JP;
Kazuhiko Mizuno, Sodegaura, JP;
Satoshi Yamaguchi, Ichihara, JP;
Takanori Yamagishi, Funabashi, JP;
Tomo Oikawa, Ichihara, JP;
Ichiro Kato, Chiba, JP;
Kazuhiko Mizuno, Sodegaura, JP;
Satoshi Yamaguchi, Ichihara, JP;
Maruzen Petrochemical Co., Ltd., Tokyo, JP;
Abstract
Solving problems in the prior art, provided are a resist polymer which is small in lot-to-lot, reactor-to-reactor and scale-to-scale variations, and contains no high polymer, is excellent in solubility and storage stability, and is suitable for fine pattern formation, and a method for production thereof. The present invention provides the resist polymer at least having a repeating unit having a structure which is decomposed by an acid to become soluble in an alkali developer and a repeating unit having a polar group to enhance adhesion to a substrate, characterized in that a peak area of a high molecular weight component (high polymer) with molecular weight of 100,000 or more is 0.1% or less based on an entire peak area in a molecular weight distribution determined, by gel permeation chromatography (GPC).