The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Apr. 11, 2008
Applicants:
Minhua LU, Mohegan Lake, NY (US);
Nils D. Hoivik, Billingstad, NO;
Christopher Jahnes, Upper Saddle River, NJ (US);
John M. Cotte, New Fairfield, CT (US);
Hongqing Zhang, Bethlehem, PA (US);
Inventors:
Minhua Lu, Mohegan Lake, NY (US);
Nils D. Hoivik, Billingstad, NO;
Christopher Jahnes, Upper Saddle River, NJ (US);
John M. Cotte, New Fairfield, CT (US);
Hongqing Zhang, Bethlehem, PA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The beam bending of a MEMS device is minimized by reducing interfacial strength between a sacrificial layer and a MEMS structure.
Quick Actions:
Lu, Minhua. (2012). Method of minimizing beam bending of mems device by reducing the interfacial bonding strength between sacrificial layer and mems structure (U.S. Patent No. 8163584). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8163584
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile