The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Jul. 28, 2009
Yongfa Fan, San Jose, CA (US);
Yongfa Fan, San Jose, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
Some embodiments provide a system for accurately and efficiently modeling chemically amplified resist. During operation, the system can determine a quenched acid profile from an initial acid profile by applying multiple quenching models which are associated with different acid concentration ranges to the initial acid profile. One quenching model may be expressed as H=H−B, where H is an acid profile after quenching, His an acid profile before quenching, and Bis an initial base quencher profile. Another quenching model may be expressed as H=k·H, where k is a constant. Next, the system can apply a smoothing kernel to the quenched acid profile to obtain a quenched-and-diffused acid profile. The smoothing kernel can generally be any weighted averaging function. The quenched-and-diffused acid profile can then be used to predict shapes that are expected to print on the wafer and to perform resolution enhancement techniques on a layout.