The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8160349 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 17, 2012

Filed:

Apr. 20, 2007
Applicant:

Tadashi Mitsui, Kamakura, JP;

Inventor:

Tadashi Mitsui, Kamakura, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/46 (2006.01); G06K 9/68 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern shape evaluation method comprising detecting an edge of an evaluation target pattern from an image of the evaluation target pattern to output the edge as a first edge, detecting an edge of a reference pattern from an image of the reference pattern to output the edge as a second edge, performing a relative scan of the first edge and the second edge to superpose the first edge onto the second edge, and outputting a resulting edge as a third edge, calculating a characteristic amount indicating characteristics of the third edge from the third edge, and deriving a characteristic amount function which provides the characteristic amount against relative coordinates in the relative scan and comparing the characteristic amount function with a preset value to judge whether or not the evaluation target pattern is good.


Find Patent Forward Citations

Mitsui, Tadashi. (2012). Pattern shape evaluation method, program, and semiconductor device manufacturing method (U.S. Patent No. 8160349). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8160349

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