The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2012
Filed:
Dec. 18, 2006
Kevin Chan, San Jose, CA (US);
Emmanuel Drege, Los Gatos, CA (US);
Nickhil Jakatdar, Los Altos, CA (US);
Svetlana Litvintseva, San Jose, CA (US);
Mark A. Miller, Pleasanton, CA (US);
Francis Raquel, Danville, CA (US);
Kevin Chan, San Jose, CA (US);
Emmanuel Drege, Los Gatos, CA (US);
Nickhil Jakatdar, Los Altos, CA (US);
Svetlana Litvintseva, San Jose, CA (US);
Mark A. Miller, Pleasanton, CA (US);
Francis Raquel, Danville, CA (US);
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
A method and apparatus for mask optimization is provided. Mask design and production is optimized by providing proper weighting parameters for critical features. The parameters may include information such as parametric information, functional information, and hot spots determination.